Today, semiconductor thin films have a very important place in electronic and optoelectronic device technology. Semiconductor thin films, with their broad range of applications, can achieve high performance by adjusting parameters. This performance is directly related to deposition methods. Deposition methods enable semiconductor thin films to exhibit unique properties, such as enhanced electrical conductivity, improved optical transparency, and tailored surface morphology which are not achievable in bulk materials. For instance, thin films produced by chemical vapor deposition can achieve higher purity and better uniformity compared to their bulk counterparts. New alternative methods for the deposition of semiconductor thin films have emerged with the development of technology. In this study, deposition methods of semiconductor thin films are reviewed under three main headings: vapor, liquid and solid phase deposition. Under each main heading, the most commonly used deposition methods in the literature are described. Application areas of semiconductor thin films in technology are summarized.